Fundamentals of plasma processing(IV) Diagnostics of process plasma.

Diagnostics and troubleshooting of High Density Plasma Process

Introduction and motivation. This work presents results of electrical failure analysis and troubleshooting in an automotive ASIC. An unusual pattern of yield drop-out at sort test occurred suddenly on product which has been in manufacturing for years; no other products were affected by the problem. The pattern indicated strong wafer odd-even effect within a batch with up to 20% yield loss on th...

X-ray plasma diagnostics

Results and methods are given for the investigation of hot laboratory and astrophysical plasmas parameters in a soft X-ray region 1 = 1-40 A. Line spectra of multiply charged ions are usually studied exper~mentally, and relative Intensities of spectral lines are measured. Achievements of modern physics of electronion collisions and theoretical spectroscopy make it possible to obtain for transie...

Fundamentals of Plasma Physics and Controlled Fusion

Plasma-driven ultrashort bunch diagnostics

Ultrashort electron bunches are crucial for an increasing number of applications, however, diagnosing their longitudinal phase space remains a challenge. We propose a new method that harnesses the strong electric fields present in a laser driven plasma wakefield. By transversely displacing driver laser and witness bunch, a streaking field is applied to the bunch. This field maps the time inform...

Optical Techniques in Plasma Diagnostics

Recent developments in optical techniques for plasma diagnostics are critically reviewed. The primary emphasis is on plasma-induced emission and laser-induced fluorescence probes of radical and ionic concentrations and temperatures in low pressure discharges like those used in microelectronic fabrication. Other techniques such as optogalvanic, infrared, spontaneous and stimulated Raman, and mul...